UWTV Program: Directions and Challenges in Integrated Circuit Scaling
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Directions and Challenges in Integrated Circuit Scaling
The integrated circuit industry has enjoyed tremendous success over the past 30+ years due to the excellent scaling properties of MOS transistors. As MOSFETs have scaled, consistent improvements in density, performance and power have been realized. However, we are fast approaching practical and fundamental limits to scaling that will require new strategies to enable the industry to continue its historic rate of improvement. These strategies must include new device structures, new materials and new circuit design techniques.

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Series Title:CSE Colloquia - 2000
Subject(s):Engineering and Computer Science
Speaker(s): Mark Bohr, Intel

Related Link(s):(Abstract)
Production Date: 01/13/2000
Runtime: 01:00:53
Rating:TV-G
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